PLASMA PROCESSING APPARATUS AND CEILING WALL

There is provided a plasma processing apparatus that converts a gas supplied into a processing container into a plasma to process a substrate, the plasma processing apparatus including: a microwave introduction window disposed in each of a plurality of openings formed in a ceiling wall of the proces...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	EMORI, Soudai, IMANAKA, Masashi, KAMATA, Eiki, IKEDA, Taro, ITOH, Satoshi, OZAKI, Shigenori
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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