PULSED PLASMA CHAMBER IN DUAL CHAMBER CONFIGURATION

Embodiments for processing a substrate in a pulsed plasma chamber are provided. A processing apparatus with two chambers, separated by a plate fluidly connecting the chambers, includes a continuous wave (CW) controller, a pulse controller, and a system controller. The CW controller sets the voltage...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Bailey, III, Andrew D, Marakhtanov, Alexei, Hudson, Eric, Dhindsa, Rajinder
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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