PROCESSING LIQUID SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR INSPECTING PROCESSING LIQUID SUPPLY DEVICE
According to one embodiment, a processing liquid supply device includes: a tank that stores the processing liquid; a supply path that supplies the processing liquid to the processing device; a heater that heats the processing liquid; a thermometer that measures a temperature of the processing liquid...
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creator | FURUYA, Masaaki MORI, Hideki KOBAYASHI, Hiroaki |
description | According to one embodiment, a processing liquid supply device includes: a tank that stores the processing liquid; a supply path that supplies the processing liquid to the processing device; a heater that heats the processing liquid; a thermometer that measures a temperature of the processing liquid; a densitometer that measures a concentration of the processing liquid; and a controller including an inspecting unit that inspects the densitometer. The inspecting unit includes: a temperature setting device that sets a boiling point temperature at which a predetermined concentration is reached as a predetermined temperature; a heating controller that heats the processing liquid by the heater so as to reach a target temperature within a predetermined range; and a determination device that determines whether or not the concentration of the processing liquid is a target concentration within a predetermined range based on the predetermined concentration. |
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The inspecting unit includes: a temperature setting device that sets a boiling point temperature at which a predetermined concentration is reached as a predetermined temperature; a heating controller that heats the processing liquid by the heater so as to reach a target temperature within a predetermined range; and a determination device that determines whether or not the concentration of the processing liquid is a target concentration within a predetermined range based on the predetermined concentration.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230928&DB=EPODOC&CC=US&NR=2023307263A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230928&DB=EPODOC&CC=US&NR=2023307263A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>FURUYA, Masaaki</creatorcontrib><creatorcontrib>MORI, Hideki</creatorcontrib><creatorcontrib>KOBAYASHI, Hiroaki</creatorcontrib><title>PROCESSING LIQUID SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR INSPECTING PROCESSING LIQUID SUPPLY DEVICE</title><description>According to one embodiment, a processing liquid supply device includes: a tank that stores the processing liquid; a supply path that supplies the processing liquid to the processing device; a heater that heats the processing liquid; a thermometer that measures a temperature of the processing liquid; a densitometer that measures a concentration of the processing liquid; and a controller including an inspecting unit that inspects the densitometer. The inspecting unit includes: a temperature setting device that sets a boiling point temperature at which a predetermined concentration is reached as a predetermined temperature; a heating controller that heats the processing liquid by the heater so as to reach a target temperature within a predetermined range; and a determination device that determines whether or not the concentration of the processing liquid is a target concentration within a predetermined range based on the predetermined concentration.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZKgKCPJ3dg0O9vRzV_DxDAz1dFEIDg0I8IlUcHEN83R21QFynYJDghxDXBWQlDoGBDgCxUKDdRQc_VwUfF1DPPxdFNz8gxQ8_YIDXJ1DQIoIGM3DwJqWmFOcyguluRmU3VxDnD10Uwvy41OLCxKTU_NSS-JDg40MjIyNDcyNzIwdDY2JUwUAVFE8Aw</recordid><startdate>20230928</startdate><enddate>20230928</enddate><creator>FURUYA, Masaaki</creator><creator>MORI, Hideki</creator><creator>KOBAYASHI, Hiroaki</creator><scope>EVB</scope></search><sort><creationdate>20230928</creationdate><title>PROCESSING LIQUID SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR INSPECTING PROCESSING LIQUID SUPPLY DEVICE</title><author>FURUYA, Masaaki ; MORI, Hideki ; KOBAYASHI, Hiroaki</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2023307263A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>FURUYA, Masaaki</creatorcontrib><creatorcontrib>MORI, Hideki</creatorcontrib><creatorcontrib>KOBAYASHI, Hiroaki</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>FURUYA, Masaaki</au><au>MORI, Hideki</au><au>KOBAYASHI, Hiroaki</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCESSING LIQUID SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR INSPECTING PROCESSING LIQUID SUPPLY DEVICE</title><date>2023-09-28</date><risdate>2023</risdate><abstract>According to one embodiment, a processing liquid supply device includes: a tank that stores the processing liquid; a supply path that supplies the processing liquid to the processing device; a heater that heats the processing liquid; a thermometer that measures a temperature of the processing liquid; a densitometer that measures a concentration of the processing liquid; and a controller including an inspecting unit that inspects the densitometer. The inspecting unit includes: a temperature setting device that sets a boiling point temperature at which a predetermined concentration is reached as a predetermined temperature; a heating controller that heats the processing liquid by the heater so as to reach a target temperature within a predetermined range; and a determination device that determines whether or not the concentration of the processing liquid is a target concentration within a predetermined range based on the predetermined concentration.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | PROCESSING LIQUID SUPPLY DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD FOR INSPECTING PROCESSING LIQUID SUPPLY DEVICE |
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