ETCHANT COMPOSITION OF TITANIUM LAYER AND ETCHING METHOD USING THE SAME
Provided are an etchant composition of a titanium layer and a method using the same, which may selectively etch the titanium layer without affecting the quality of other layers during a process of manufacturing a semiconductor and a display device, and thus, may increase productivity and reliability...
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| creator | JEONG, Min Gyeong KIM, Se Hoon LEE, Bo Yeon PARK, Sang Seung KIM, Yang Ryoung |
| description | Provided are an etchant composition of a titanium layer and a method using the same, which may selectively etch the titanium layer without affecting the quality of other layers during a process of manufacturing a semiconductor and a display device, and thus, may increase productivity and reliability with improved etching characteristics in a semiconductor manufacturing process. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2023303925A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2023303925A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2023303925A13</originalsourceid><addsrcrecordid>eNrjZHB3DXH2cPQLUXD29w3wD_YM8fT3U_B3UwjxDHH08wz1VfBxjHQNUnD0c1EAqfT0c1fwdQ3x8HdRCA0GcUI8XBWCHX1deRhY0xJzilN5oTQ3g7IbSINuakF-fGpxQWJyal5qSXxosJGBkbGxgbGlkamjoTFxqgCCPi1X</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ETCHANT COMPOSITION OF TITANIUM LAYER AND ETCHING METHOD USING THE SAME</title><source>esp@cenet</source><creator>JEONG, Min Gyeong ; KIM, Se Hoon ; LEE, Bo Yeon ; PARK, Sang Seung ; KIM, Yang Ryoung</creator><creatorcontrib>JEONG, Min Gyeong ; KIM, Se Hoon ; LEE, Bo Yeon ; PARK, Sang Seung ; KIM, Yang Ryoung</creatorcontrib><description>Provided are an etchant composition of a titanium layer and a method using the same, which may selectively etch the titanium layer without affecting the quality of other layers during a process of manufacturing a semiconductor and a display device, and thus, may increase productivity and reliability with improved etching characteristics in a semiconductor manufacturing process.</description><language>eng</language><subject>ADHESIVES ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; PAINTS ; POLISHES ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230928&DB=EPODOC&CC=US&NR=2023303925A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230928&DB=EPODOC&CC=US&NR=2023303925A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JEONG, Min Gyeong</creatorcontrib><creatorcontrib>KIM, Se Hoon</creatorcontrib><creatorcontrib>LEE, Bo Yeon</creatorcontrib><creatorcontrib>PARK, Sang Seung</creatorcontrib><creatorcontrib>KIM, Yang Ryoung</creatorcontrib><title>ETCHANT COMPOSITION OF TITANIUM LAYER AND ETCHING METHOD USING THE SAME</title><description>Provided are an etchant composition of a titanium layer and a method using the same, which may selectively etch the titanium layer without affecting the quality of other layers during a process of manufacturing a semiconductor and a display device, and thus, may increase productivity and reliability with improved etching characteristics in a semiconductor manufacturing process.</description><subject>ADHESIVES</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZHB3DXH2cPQLUXD29w3wD_YM8fT3U_B3UwjxDHH08wz1VfBxjHQNUnD0c1EAqfT0c1fwdQ3x8HdRCA0GcUI8XBWCHX1deRhY0xJzilN5oTQ3g7IbSINuakF-fGpxQWJyal5qSXxosJGBkbGxgbGlkamjoTFxqgCCPi1X</recordid><startdate>20230928</startdate><enddate>20230928</enddate><creator>JEONG, Min Gyeong</creator><creator>KIM, Se Hoon</creator><creator>LEE, Bo Yeon</creator><creator>PARK, Sang Seung</creator><creator>KIM, Yang Ryoung</creator><scope>EVB</scope></search><sort><creationdate>20230928</creationdate><title>ETCHANT COMPOSITION OF TITANIUM LAYER AND ETCHING METHOD USING THE SAME</title><author>JEONG, Min Gyeong ; KIM, Se Hoon ; LEE, Bo Yeon ; PARK, Sang Seung ; KIM, Yang Ryoung</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2023303925A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>ADHESIVES</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>JEONG, Min Gyeong</creatorcontrib><creatorcontrib>KIM, Se Hoon</creatorcontrib><creatorcontrib>LEE, Bo Yeon</creatorcontrib><creatorcontrib>PARK, Sang Seung</creatorcontrib><creatorcontrib>KIM, Yang Ryoung</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JEONG, Min Gyeong</au><au>KIM, Se Hoon</au><au>LEE, Bo Yeon</au><au>PARK, Sang Seung</au><au>KIM, Yang Ryoung</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ETCHANT COMPOSITION OF TITANIUM LAYER AND ETCHING METHOD USING THE SAME</title><date>2023-09-28</date><risdate>2023</risdate><abstract>Provided are an etchant composition of a titanium layer and a method using the same, which may selectively etch the titanium layer without affecting the quality of other layers during a process of manufacturing a semiconductor and a display device, and thus, may increase productivity and reliability with improved etching characteristics in a semiconductor manufacturing process.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES BASIC ELECTRIC ELEMENTS CHEMISTRY DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES SEMICONDUCTOR DEVICES |
| title | ETCHANT COMPOSITION OF TITANIUM LAYER AND ETCHING METHOD USING THE SAME |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-27T23%3A21%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=JEONG,%20Min%20Gyeong&rft.date=2023-09-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2023303925A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |