Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System

A first radiofrequency signal generator is set to generate a low frequency signal. A second radiofrequency signal generator is set to generate a high frequency signal. An impedance matching system has a first input connected to an output of the first radiofrequency signal generator and a second inpu...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Bhowmick, Ranadeep, Kozakevich, Felix Leib, Holland, John, Marakhtanov, Alexei
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
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