Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System

Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System

A first radiofrequency signal generator is set to generate a low frequency signal. A second radiofrequency signal generator is set to generate a high frequency signal. An impedance matching system has a first input connected to an output of the first radiofrequency signal generator and a second inpu...

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Hauptverfasser: Bhowmick, Ranadeep, Kozakevich, Felix Leib, Holland, John, Marakhtanov, Alexei
Format: Patent
Sprache:eng
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BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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creator Bhowmick, Ranadeep
Kozakevich, Felix Leib
Holland, John
Marakhtanov, Alexei
description A first radiofrequency signal generator is set to generate a low frequency signal. A second radiofrequency signal generator is set to generate a high frequency signal. An impedance matching system has a first input connected to an output of the first radiofrequency signal generator and a second input connected to an output of the second radiofrequency signal generator. The impedance matching system controls impedances at the outputs of the first and second radiofrequency signal generators. An output of the impedance matching system is connected to a radiofrequency supply input of a plasma processing system. A control module monitors reflected voltage at the output of the second radiofrequency signal generator. The control module determines when the reflected voltage indicates a change in impedance along a transmission path of the high frequency signal that is indicative of a particular process condition and/or event within the plasma processing system.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System
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