SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR FABRICATION PROCESSES

Systems and methods for producing ultrapure water (UPW) for use in semiconductor fabrication include an ABA module that performs an advanced oxidation process (AOP) pre-treatment step, a bioremediation step, and an advanced oxidation process post-treatment step. Raw water flows through the ABA modul...

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Hauptverfasser: Lin, En Tian, Chiang, Shih-Hsiung
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Chiang, Shih-Hsiung
description Systems and methods for producing ultrapure water (UPW) for use in semiconductor fabrication include an ABA module that performs an advanced oxidation process (AOP) pre-treatment step, a bioremediation step, and an advanced oxidation process post-treatment step. Raw water flows through the ABA module, which is part of a water treatment system for producing ultrapure water. The ultrapure water is then used in a semiconductor fabrication process.
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
title SYSTEMS AND METHODS FOR PRODUCING ULTRAPURE WATER FOR SEMICONDUCTOR FABRICATION PROCESSES
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