WAFER CARRIER AND SYSTEM FOR AN EPITAXIAL APPARATUS

A wafer carrier may include a first main surface suitable for receiving wafers, a second main surface arranged on a side opposite to the first main surface, and an annular depression or an elevation containing wafer carrier material in the region of the second main surface, concentric with respect t...

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Bibliographische Detailangaben
Hauptverfasser: OFF, Juergen, DIMMELMEIER, Harald, LAUX, Harald
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A wafer carrier may include a first main surface suitable for receiving wafers, a second main surface arranged on a side opposite to the first main surface, and an annular depression or an elevation containing wafer carrier material in the region of the second main surface, concentric with respect to the wafer carrier.