SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD

Provided is a semiconductor device including: a first trench contact portion provided to an inside of a contact region; a second trench contact portion provided to an inside of an emitter region; a first plug portion of a second conductivity type, which is provided in contact with a lower end of the...

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Bibliographische Detailangaben
Hauptverfasser: HAMASAKI, Ryutaro, YAMADA, Takuya, NOGUCHI, Seiji, SAKURAI, Yosuke, OZAKI, Daisuke
Format: Patent
Sprache:eng
Schlagworte:
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