DEFECT DETECTION FOR SEMICONDUCTOR STRUCTURES ON A WAFER

A method of a defect detection of a plurality of semiconductor structures arranged on a wafer includes obtaining a microscopic image of the wafer. The microscopic image depicts the plurality of semiconductor structures. The method also includes obtaining, from a database, fingerprint data for each b...

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Bibliographische Detailangaben
Hauptverfasser: Huethwohl, Philipp, Korb, Thomas, Neumann, Jens Timo
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of a defect detection of a plurality of semiconductor structures arranged on a wafer includes obtaining a microscopic image of the wafer. The microscopic image depicts the plurality of semiconductor structures. The method also includes obtaining, from a database, fingerprint data for each base pattern class of a set of base pattern classes associated with respective one or more semiconductor structures of the plurality of semiconductor structures. The method further includes performing the defect detection based on the fingerprint data and the microscopic image.