SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM

A substrate processing apparatus includes: a rotary holder configured to hold and rotate a substrate; a cup arranged so as to surround the substrate held by the rotary holder; a coating liquid nozzle configured to inject a coating liquid onto the substrate; a removal liquid nozzle configured to inje...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MIZUSHINO, Shinichi, KAJIWARA, Hideki, SAKAI, Yuji, TOYOZAWA, Akihiro, MATSUURA, Kazuhiro, SHIGEMOTO, Hokuto, KUNUGIMOTO, Yuichiro
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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