SEMICONDUCTOR DEVICE METHOD FOR FORMING THE SAME

A semiconductor device is provided. The semiconductor device includes a substrate, a fin structure and an epitaxial source/drain structure. The substrate includes a substrate layer and an insulator layer on the substrate layer. The fin structure is formed over the substrate, wherein the fin structur...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIN, Hsien-Hsin, TSAO, Po-Chao
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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