PROCESS WINDOW BASED ON FAILURE RATE

A method for determining a process window of a patterning process based on a failure rate. The method includes obtaining a plurality of features printed on a substrate, grouping, based on a metric, the features into a plurality of groups, and generating, based on measurement data associated with a g...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANG, Fuming, JIANG, Aiqin, YAN, Fei, FREEMAN, Jill Elizabeth, RAGHUNATHAN, Suharshanan
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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