IMPRINT LITHOGRAPHY
An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a positi...
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| creator | KRUIJT-STEGEMAN, Yvonne Wendela WUISTER, Sander Frederik JEUNINK, Andre Bernardus JANSEN, Norbert Erwin Therenzo DE FOCKERT, George Arie Jan VAN SCHOTHORST, Gerard DIJKSMAN, Johan Frederik VAN BAARS, Gregor Edward RENKENS, Michael Jozef Mathijs HARDEMAN, Toon DE SCHIFFART, Catharinus |
| description | An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame. |
| format | Patent |
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WUISTER, Sander Frederik ; JEUNINK, Andre Bernardus ; JANSEN, Norbert Erwin Therenzo ; DE FOCKERT, George Arie Jan ; VAN SCHOTHORST, Gerard ; DIJKSMAN, Johan Frederik ; VAN BAARS, Gregor Edward ; RENKENS, Michael Jozef Mathijs ; HARDEMAN, Toon ; DE SCHIFFART, Catharinus</creatorcontrib><description>An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | IMPRINT LITHOGRAPHY |
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