APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING A SUBSTRATE

The inventive concept provides a substrate treating method. The substrate treating method includes first treating a substrate in a treating space according to a reference recipe; second treating a substrate in the treating space according to the reference recipe after the first treating; and optimiz...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Oh, Seung Un, Kang, Ki-Moon
Format: Patent
Sprache:eng
Schlagworte:
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