MEMORY DEVICE

A memory device includes a semiconductor substrate and a memory cell at a memory region of the semiconductor substrate. A memory cell includes a memory portion of the semiconductor substrate, a tunneling layer, a storage layer, a first electrode, and a second electrode. The tunneling layer is over t...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HWU, Jenn-Gwo, LIN, Kuan-Wun, CHEN, Bo-Jyun
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A memory device includes a semiconductor substrate and a memory cell at a memory region of the semiconductor substrate. A memory cell includes a memory portion of the semiconductor substrate, a tunneling layer, a storage layer, a first electrode, and a second electrode. The tunneling layer is over the memory portion of the semiconductor substrate. The storage layer is over and in contact with the tunneling layer. The first electrode is over the storage layer. The second electrode is over and in contact with the tunneling layer but is spaced apart from the storage layer.