MICROELECTRONIC DEVICES INCLUDING STACK STRUCTURES HAVING AIR GAPS, AND RELATED MEMORY DEVICES, ELECTRONIC SYSTEMS, AND METHODS

A microelectronic device comprises a stack structure, a staircase structure, an etch stop material, and insulative material. The stack structure comprises conductive structures, and air gaps vertically alternating with the conductive structures. The staircase structure is within the stack structure...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Surthi, Shyam, Kim, Byeung Chul
Format: Patent
Sprache:eng
Schlagworte:
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