SEMICONDUCTOR DEVICE

A method of forming a semiconductor device includes the following steps. First of all, a substrate is provided, and a dielectric layer is formed on the substrate. Then, at least one trench is formed in the dielectric layer, to partially expose a top surface of the substrate. The trench includes a di...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Chung, Ting-Pang, Lee, Luo-Hsin, Wu, Po-Han, Hung, Shih-Han, Chan, Shu-Yen, Tzou, Shih-Fang
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRICITY
Online-Zugang:	Volltext bestellen
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