APPARATUS AND METHOD OF SUPPLYING CHEMICAL LIQUID AND SUBSTRATE TREATING APPARATUS

APPARATUS AND METHOD OF SUPPLYING CHEMICAL LIQUID AND SUBSTRATE TREATING APPARATUS

Provided is an apparatus for supplying a chemical liquid, the apparatus including: a storage tank in which a chemical liquid is stored; a discharge line through which the chemical liquid stored in the storage tank is discharged; a level tube connected to the storage tank so as to check a water level...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Park, Sang Woo, Ha, Do Gyeong, YUN, Tae Suk, Yang, Seung Tae, Choi, Moon Soon, Jung, Bu Young, Lim, Chae Young
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
MEASURING
MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL
METERING BY VOLUME
PERFORMING OPERATIONS
PHYSICS
SPRAYING OR ATOMISING IN GENERAL
TESTING
TRANSPORTING
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Park, Sang Woo
Ha, Do Gyeong
YUN, Tae Suk
Yang, Seung Tae
Choi, Moon Soon
Jung, Bu Young
Lim, Chae Young
description Provided is an apparatus for supplying a chemical liquid, the apparatus including: a storage tank in which a chemical liquid is stored; a discharge line through which the chemical liquid stored in the storage tank is discharged; a level tube connected to the storage tank so as to check a water level of the chemical liquid in the storage tank and receiving the chemical liquid at the same water level as the water level of the chemical liquid in the storage tank; and a controller for controlling a first valve installed in the discharge line, in which the level tube has one end connected to an upper space of the storage tank and the other end connected to the discharge line.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2023184574A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2023184574A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2023184574A13</originalsourceid><addsrcrecordid>eNrjZAhyDAhwDHIMCQ1WcPRzUfB1DfHwd1Hwd1MIDg0I8In09HNXcPZw9fV0dvRR8PEMDPV0AasLDnUKDgFqc1UICXJ1DAEpgxvEw8CalphTnMoLpbkZlN1cQ5w9dFML8uNTiwsSk1PzUkviQ4ONDIyMDS1MTM1NHA2NiVMFAJ5IMLc</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>APPARATUS AND METHOD OF SUPPLYING CHEMICAL LIQUID AND SUBSTRATE TREATING APPARATUS</title><source>esp@cenet</source><creator>Park, Sang Woo ; Ha, Do Gyeong ; YUN, Tae Suk ; Yang, Seung Tae ; Choi, Moon Soon ; Jung, Bu Young ; Lim, Chae Young</creator><creatorcontrib>Park, Sang Woo ; Ha, Do Gyeong ; YUN, Tae Suk ; Yang, Seung Tae ; Choi, Moon Soon ; Jung, Bu Young ; Lim, Chae Young</creatorcontrib><description>Provided is an apparatus for supplying a chemical liquid, the apparatus including: a storage tank in which a chemical liquid is stored; a discharge line through which the chemical liquid stored in the storage tank is discharged; a level tube connected to the storage tank so as to check a water level of the chemical liquid in the storage tank and receiving the chemical liquid at the same water level as the water level of the chemical liquid in the storage tank; and a controller for controlling a first valve installed in the discharge line, in which the level tube has one end connected to an upper space of the storage tank and the other end connected to the discharge line.</description><language>eng</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; MEASURING ; MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL ; METERING BY VOLUME ; PERFORMING OPERATIONS ; PHYSICS ; SPRAYING OR ATOMISING IN GENERAL ; TESTING ; TRANSPORTING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230615&amp;DB=EPODOC&amp;CC=US&amp;NR=2023184574A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230615&amp;DB=EPODOC&amp;CC=US&amp;NR=2023184574A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Park, Sang Woo</creatorcontrib><creatorcontrib>Ha, Do Gyeong</creatorcontrib><creatorcontrib>YUN, Tae Suk</creatorcontrib><creatorcontrib>Yang, Seung Tae</creatorcontrib><creatorcontrib>Choi, Moon Soon</creatorcontrib><creatorcontrib>Jung, Bu Young</creatorcontrib><creatorcontrib>Lim, Chae Young</creatorcontrib><title>APPARATUS AND METHOD OF SUPPLYING CHEMICAL LIQUID AND SUBSTRATE TREATING APPARATUS</title><description>Provided is an apparatus for supplying a chemical liquid, the apparatus including: a storage tank in which a chemical liquid is stored; a discharge line through which the chemical liquid stored in the storage tank is discharged; a level tube connected to the storage tank so as to check a water level of the chemical liquid in the storage tank and receiving the chemical liquid at the same water level as the water level of the chemical liquid in the storage tank; and a controller for controlling a first valve installed in the discharge line, in which the level tube has one end connected to an upper space of the storage tank and the other end connected to the discharge line.</description><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>MEASURING</subject><subject>MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL</subject><subject>METERING BY VOLUME</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TESTING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAhyDAhwDHIMCQ1WcPRzUfB1DfHwd1Hwd1MIDg0I8In09HNXcPZw9fV0dvRR8PEMDPV0AasLDnUKDgFqc1UICXJ1DAEpgxvEw8CalphTnMoLpbkZlN1cQ5w9dFML8uNTiwsSk1PzUkviQ4ONDIyMDS1MTM1NHA2NiVMFAJ5IMLc</recordid><startdate>20230615</startdate><enddate>20230615</enddate><creator>Park, Sang Woo</creator><creator>Ha, Do Gyeong</creator><creator>YUN, Tae Suk</creator><creator>Yang, Seung Tae</creator><creator>Choi, Moon Soon</creator><creator>Jung, Bu Young</creator><creator>Lim, Chae Young</creator><scope>EVB</scope></search><sort><creationdate>20230615</creationdate><title>APPARATUS AND METHOD OF SUPPLYING CHEMICAL LIQUID AND SUBSTRATE TREATING APPARATUS</title><author>Park, Sang Woo ; Ha, Do Gyeong ; YUN, Tae Suk ; Yang, Seung Tae ; Choi, Moon Soon ; Jung, Bu Young ; Lim, Chae Young</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2023184574A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>MEASURING</topic><topic>MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL</topic><topic>METERING BY VOLUME</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TESTING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Park, Sang Woo</creatorcontrib><creatorcontrib>Ha, Do Gyeong</creatorcontrib><creatorcontrib>YUN, Tae Suk</creatorcontrib><creatorcontrib>Yang, Seung Tae</creatorcontrib><creatorcontrib>Choi, Moon Soon</creatorcontrib><creatorcontrib>Jung, Bu Young</creatorcontrib><creatorcontrib>Lim, Chae Young</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Park, Sang Woo</au><au>Ha, Do Gyeong</au><au>YUN, Tae Suk</au><au>Yang, Seung Tae</au><au>Choi, Moon Soon</au><au>Jung, Bu Young</au><au>Lim, Chae Young</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS AND METHOD OF SUPPLYING CHEMICAL LIQUID AND SUBSTRATE TREATING APPARATUS</title><date>2023-06-15</date><risdate>2023</risdate><abstract>Provided is an apparatus for supplying a chemical liquid, the apparatus including: a storage tank in which a chemical liquid is stored; a discharge line through which the chemical liquid stored in the storage tank is discharged; a level tube connected to the storage tank so as to check a water level of the chemical liquid in the storage tank and receiving the chemical liquid at the same water level as the water level of the chemical liquid in the storage tank; and a controller for controlling a first valve installed in the discharge line, in which the level tube has one end connected to an upper space of the storage tank and the other end connected to the discharge line.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2023184574A1
source esp@cenet
subjects APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
MEASURING
MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL
METERING BY VOLUME
PERFORMING OPERATIONS
PHYSICS
SPRAYING OR ATOMISING IN GENERAL
TESTING
TRANSPORTING
title APPARATUS AND METHOD OF SUPPLYING CHEMICAL LIQUID AND SUBSTRATE TREATING APPARATUS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-18T04%3A12%3A07IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Park,%20Sang%20Woo&rft.date=2023-06-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2023184574A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true