Multi-Finger Transistor Structure and Method of Manufacturing the Same
A multi-finger transistor structure is provided in the present invention, including multiple active areas, a gate structure consisting of multiple gate parts and connecting parts, wherein each gate part crosses over one of the active areas and each connecting part alternatively connects one end and...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | Sihombing, Rudy Octavius Verma, Purakh Raj Parthasarathy, Shyam LIAO, JINYU Xing, Su |
description | A multi-finger transistor structure is provided in the present invention, including multiple active areas, a gate structure consisting of multiple gate parts and connecting parts, wherein each gate part crosses over one of the active areas and each connecting part alternatively connects one end and the other end of the gate parts so as to form a meander gate structure, and multiple sources and drains, wherein one source and one drain are set between two adjacent gate parts, and each gate parts is accompanied by one source and one drain at two sides respectively, and the distance between the drain and the gate part is larger than the distance between the source and the gate part, so that the source and the drain are asymmetric with respect to the corresponding gate part, and air gaps are formed in the dielectric layer between each drain and the corresponding gate part. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2023163184A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2023163184A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2023163184A13</originalsourceid><addsrcrecordid>eNqNi7EKwjAQQLM4iPoPB84F04i4ihhcMqXO5WgvNlAvJbn8vwp-gNMb3ntrZV2dJTY28pMydBm5xCIpg5dcB6mZAHkERzKlEVIAh1wDfs1nAZkIPL5oq1YB50K7Hzdqb2_d9d7QknoqCw7EJP3Dt4fW6JPR5-NFm_-qN-WRND4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Multi-Finger Transistor Structure and Method of Manufacturing the Same</title><source>esp@cenet</source><creator>Sihombing, Rudy Octavius ; Verma, Purakh Raj ; Parthasarathy, Shyam ; LIAO, JINYU ; Xing, Su</creator><creatorcontrib>Sihombing, Rudy Octavius ; Verma, Purakh Raj ; Parthasarathy, Shyam ; LIAO, JINYU ; Xing, Su</creatorcontrib><description>A multi-finger transistor structure is provided in the present invention, including multiple active areas, a gate structure consisting of multiple gate parts and connecting parts, wherein each gate part crosses over one of the active areas and each connecting part alternatively connects one end and the other end of the gate parts so as to form a meander gate structure, and multiple sources and drains, wherein one source and one drain are set between two adjacent gate parts, and each gate parts is accompanied by one source and one drain at two sides respectively, and the distance between the drain and the gate part is larger than the distance between the source and the gate part, so that the source and the drain are asymmetric with respect to the corresponding gate part, and air gaps are formed in the dielectric layer between each drain and the corresponding gate part.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230525&DB=EPODOC&CC=US&NR=2023163184A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230525&DB=EPODOC&CC=US&NR=2023163184A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Sihombing, Rudy Octavius</creatorcontrib><creatorcontrib>Verma, Purakh Raj</creatorcontrib><creatorcontrib>Parthasarathy, Shyam</creatorcontrib><creatorcontrib>LIAO, JINYU</creatorcontrib><creatorcontrib>Xing, Su</creatorcontrib><title>Multi-Finger Transistor Structure and Method of Manufacturing the Same</title><description>A multi-finger transistor structure is provided in the present invention, including multiple active areas, a gate structure consisting of multiple gate parts and connecting parts, wherein each gate part crosses over one of the active areas and each connecting part alternatively connects one end and the other end of the gate parts so as to form a meander gate structure, and multiple sources and drains, wherein one source and one drain are set between two adjacent gate parts, and each gate parts is accompanied by one source and one drain at two sides respectively, and the distance between the drain and the gate part is larger than the distance between the source and the gate part, so that the source and the drain are asymmetric with respect to the corresponding gate part, and air gaps are formed in the dielectric layer between each drain and the corresponding gate part.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7EKwjAQQLM4iPoPB84F04i4ihhcMqXO5WgvNlAvJbn8vwp-gNMb3ntrZV2dJTY28pMydBm5xCIpg5dcB6mZAHkERzKlEVIAh1wDfs1nAZkIPL5oq1YB50K7Hzdqb2_d9d7QknoqCw7EJP3Dt4fW6JPR5-NFm_-qN-WRND4</recordid><startdate>20230525</startdate><enddate>20230525</enddate><creator>Sihombing, Rudy Octavius</creator><creator>Verma, Purakh Raj</creator><creator>Parthasarathy, Shyam</creator><creator>LIAO, JINYU</creator><creator>Xing, Su</creator><scope>EVB</scope></search><sort><creationdate>20230525</creationdate><title>Multi-Finger Transistor Structure and Method of Manufacturing the Same</title><author>Sihombing, Rudy Octavius ; Verma, Purakh Raj ; Parthasarathy, Shyam ; LIAO, JINYU ; Xing, Su</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2023163184A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>Sihombing, Rudy Octavius</creatorcontrib><creatorcontrib>Verma, Purakh Raj</creatorcontrib><creatorcontrib>Parthasarathy, Shyam</creatorcontrib><creatorcontrib>LIAO, JINYU</creatorcontrib><creatorcontrib>Xing, Su</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Sihombing, Rudy Octavius</au><au>Verma, Purakh Raj</au><au>Parthasarathy, Shyam</au><au>LIAO, JINYU</au><au>Xing, Su</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Multi-Finger Transistor Structure and Method of Manufacturing the Same</title><date>2023-05-25</date><risdate>2023</risdate><abstract>A multi-finger transistor structure is provided in the present invention, including multiple active areas, a gate structure consisting of multiple gate parts and connecting parts, wherein each gate part crosses over one of the active areas and each connecting part alternatively connects one end and the other end of the gate parts so as to form a meander gate structure, and multiple sources and drains, wherein one source and one drain are set between two adjacent gate parts, and each gate parts is accompanied by one source and one drain at two sides respectively, and the distance between the drain and the gate part is larger than the distance between the source and the gate part, so that the source and the drain are asymmetric with respect to the corresponding gate part, and air gaps are formed in the dielectric layer between each drain and the corresponding gate part.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US2023163184A1 |
source | esp@cenet |
subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | Multi-Finger Transistor Structure and Method of Manufacturing the Same |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-29T12%3A53%3A01IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Sihombing,%20Rudy%20Octavius&rft.date=2023-05-25&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2023163184A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |