PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING SAME

A plasma processing apparatus includes: a plasma chamber including a first area and a second area; a first radio frequency (RF) power source transmitting pieces of first RF power to the first area; a second RF power source transmitting second RF power to the second area; a controller configured to c...

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Bibliographische Detailangaben
Hauptverfasser: Yang, Janggyoo, Shim, Seungbo, Kim, Kyungsun, NA, Donghyeon, Park, Soonam
Format: Patent
Sprache:eng
Schlagworte:
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