CONTACT OVER ACTIVE GATE STRUCTURES FOR ADVANCED INTEGRATED CIRCUIT STRUCTURE FABRICATION

Embodiments of the disclosure are in the field of advanced integrated circuit structure fabrication and, in particular, 10 nanometer node and smaller integrated circuit structure fabrication and the resulting structures. In an example, an integrated circuit structure includes first and second gate d...

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Bibliographische Detailangaben
Hauptverfasser: MADHAVAN, Atul, AUTH, Christopher P, YEOH, Andrew W, HATTENDORF, Michael L, GHANI, Tahir
Format: Patent
Sprache:eng
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