BLANK MASK AND PHOTOMASK USING THE SAME
The blank mask according to one embodiment of the present disclosure comprises a transparent substrate and a multilayer light shielding film disposed on the transparent substrate. The multilayer light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The m...
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| creator | KIM, Taewan SHIN, Inkyun KIM, Seong Yoon LEE, GeonGon CHO, Hahyeon KIM, Suhyeon CHOI, Suk Young LEE, Hyung-joo JEONG, Min Gyo SON, SUNG HOON |
| description | The blank mask according to one embodiment of the present disclosure comprises a transparent substrate and a multilayer light shielding film disposed on the transparent substrate. The multilayer light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The multilayer light shielding film comprises a first light shielding film and a second light shielding film disposed on the first light shielding film. The multilayer light shielding film comprises total nine parts that are formed by trisection in a width direction and a length direction of an upper surface of the multilayer light shielding film. Each part of the multilayer light shielding film comprises a measuring range disposed in a side thereof. The measuring range is corresponded to a range between a point distant from an upper boundary of the first light shielding film to a lower boundary of the first light shielding film and a point distant from a lower boundary of the second light shielding film to an upper boundary of the second light shielding film, in respective sides of the parts of the multilayer light shielding film. The multilayer light shielding film has dR (difference value of roughness) values of Equation 1 below respectively measured from the total nine parts of the multilayer light shielding film, and an average value of dR values of the Equation 1 is 3 nm or less.dR=Rac−Rbc [Equation 1]The Rac is a surface roughness [unit: nm] measured from the measuring range of the part of the multilayer light shielding film, after the part of the multilayer light shielding film are soaked for 800 seconds in SC-1 (Standard Clean-1) solution and rinsed by ozone water.The Rbc is a surface roughness [unit: nm] measured from the measuring range of the part of the multilayer light shielding film before the part of the multilayer light shielding film are soaked in the SC-1 solution.The SC-1 solution is a solution comprising NH4OH of 14.3 wt %, H2O2 of 14.3 wt %, and H2O of 71.4 wt %.The ozone water is a solution comprising ozone in an amount of 20 ppm (by weight) with ultrapure water as a solvent.In such a case, during an enhanced cleaning, the multilayer light shielding film can have excellent durability against a cleaning solution in all the areas thereof. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2023135037A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2023135037A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2023135037A13</originalsourceid><addsrcrecordid>eNrjZFB38nH081bwdQz2VnD0c1EI8PAP8QfzQoM9_dwVQjxcFYIdfV15GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgZGxobGpgbG5o6ExcaoATe4kYA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>BLANK MASK AND PHOTOMASK USING THE SAME</title><source>esp@cenet</source><creator>KIM, Taewan ; SHIN, Inkyun ; KIM, Seong Yoon ; LEE, GeonGon ; CHO, Hahyeon ; KIM, Suhyeon ; CHOI, Suk Young ; LEE, Hyung-joo ; JEONG, Min Gyo ; SON, SUNG HOON</creator><creatorcontrib>KIM, Taewan ; SHIN, Inkyun ; KIM, Seong Yoon ; LEE, GeonGon ; CHO, Hahyeon ; KIM, Suhyeon ; CHOI, Suk Young ; LEE, Hyung-joo ; JEONG, Min Gyo ; SON, SUNG HOON</creatorcontrib><description>The blank mask according to one embodiment of the present disclosure comprises a transparent substrate and a multilayer light shielding film disposed on the transparent substrate. The multilayer light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The multilayer light shielding film comprises a first light shielding film and a second light shielding film disposed on the first light shielding film. The multilayer light shielding film comprises total nine parts that are formed by trisection in a width direction and a length direction of an upper surface of the multilayer light shielding film. Each part of the multilayer light shielding film comprises a measuring range disposed in a side thereof. The measuring range is corresponded to a range between a point distant from an upper boundary of the first light shielding film to a lower boundary of the first light shielding film and a point distant from a lower boundary of the second light shielding film to an upper boundary of the second light shielding film, in respective sides of the parts of the multilayer light shielding film. The multilayer light shielding film has dR (difference value of roughness) values of Equation 1 below respectively measured from the total nine parts of the multilayer light shielding film, and an average value of dR values of the Equation 1 is 3 nm or less.dR=Rac−Rbc [Equation 1]The Rac is a surface roughness [unit: nm] measured from the measuring range of the part of the multilayer light shielding film, after the part of the multilayer light shielding film are soaked for 800 seconds in SC-1 (Standard Clean-1) solution and rinsed by ozone water.The Rbc is a surface roughness [unit: nm] measured from the measuring range of the part of the multilayer light shielding film before the part of the multilayer light shielding film are soaked in the SC-1 solution.The SC-1 solution is a solution comprising NH4OH of 14.3 wt %, H2O2 of 14.3 wt %, and H2O of 71.4 wt %.The ozone water is a solution comprising ozone in an amount of 20 ppm (by weight) with ultrapure water as a solvent.In such a case, during an enhanced cleaning, the multilayer light shielding film can have excellent durability against a cleaning solution in all the areas thereof.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230504&DB=EPODOC&CC=US&NR=2023135037A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230504&DB=EPODOC&CC=US&NR=2023135037A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIM, Taewan</creatorcontrib><creatorcontrib>SHIN, Inkyun</creatorcontrib><creatorcontrib>KIM, Seong Yoon</creatorcontrib><creatorcontrib>LEE, GeonGon</creatorcontrib><creatorcontrib>CHO, Hahyeon</creatorcontrib><creatorcontrib>KIM, Suhyeon</creatorcontrib><creatorcontrib>CHOI, Suk Young</creatorcontrib><creatorcontrib>LEE, Hyung-joo</creatorcontrib><creatorcontrib>JEONG, Min Gyo</creatorcontrib><creatorcontrib>SON, SUNG HOON</creatorcontrib><title>BLANK MASK AND PHOTOMASK USING THE SAME</title><description>The blank mask according to one embodiment of the present disclosure comprises a transparent substrate and a multilayer light shielding film disposed on the transparent substrate. The multilayer light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The multilayer light shielding film comprises a first light shielding film and a second light shielding film disposed on the first light shielding film. The multilayer light shielding film comprises total nine parts that are formed by trisection in a width direction and a length direction of an upper surface of the multilayer light shielding film. Each part of the multilayer light shielding film comprises a measuring range disposed in a side thereof. The measuring range is corresponded to a range between a point distant from an upper boundary of the first light shielding film to a lower boundary of the first light shielding film and a point distant from a lower boundary of the second light shielding film to an upper boundary of the second light shielding film, in respective sides of the parts of the multilayer light shielding film. The multilayer light shielding film has dR (difference value of roughness) values of Equation 1 below respectively measured from the total nine parts of the multilayer light shielding film, and an average value of dR values of the Equation 1 is 3 nm or less.dR=Rac−Rbc [Equation 1]The Rac is a surface roughness [unit: nm] measured from the measuring range of the part of the multilayer light shielding film, after the part of the multilayer light shielding film are soaked for 800 seconds in SC-1 (Standard Clean-1) solution and rinsed by ozone water.The Rbc is a surface roughness [unit: nm] measured from the measuring range of the part of the multilayer light shielding film before the part of the multilayer light shielding film are soaked in the SC-1 solution.The SC-1 solution is a solution comprising NH4OH of 14.3 wt %, H2O2 of 14.3 wt %, and H2O of 71.4 wt %.The ozone water is a solution comprising ozone in an amount of 20 ppm (by weight) with ultrapure water as a solvent.In such a case, during an enhanced cleaning, the multilayer light shielding film can have excellent durability against a cleaning solution in all the areas thereof.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFB38nH081bwdQz2VnD0c1EI8PAP8QfzQoM9_dwVQjxcFYIdfV15GFjTEnOKU3mhNDeDsptriLOHbmpBfnxqcUFicmpeakl8aLCRgZGxobGpgbG5o6ExcaoATe4kYA</recordid><startdate>20230504</startdate><enddate>20230504</enddate><creator>KIM, Taewan</creator><creator>SHIN, Inkyun</creator><creator>KIM, Seong Yoon</creator><creator>LEE, GeonGon</creator><creator>CHO, Hahyeon</creator><creator>KIM, Suhyeon</creator><creator>CHOI, Suk Young</creator><creator>LEE, Hyung-joo</creator><creator>JEONG, Min Gyo</creator><creator>SON, SUNG HOON</creator><scope>EVB</scope></search><sort><creationdate>20230504</creationdate><title>BLANK MASK AND PHOTOMASK USING THE SAME</title><author>KIM, Taewan ; SHIN, Inkyun ; KIM, Seong Yoon ; LEE, GeonGon ; CHO, Hahyeon ; KIM, Suhyeon ; CHOI, Suk Young ; LEE, Hyung-joo ; JEONG, Min Gyo ; SON, SUNG HOON</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2023135037A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>KIM, Taewan</creatorcontrib><creatorcontrib>SHIN, Inkyun</creatorcontrib><creatorcontrib>KIM, Seong Yoon</creatorcontrib><creatorcontrib>LEE, GeonGon</creatorcontrib><creatorcontrib>CHO, Hahyeon</creatorcontrib><creatorcontrib>KIM, Suhyeon</creatorcontrib><creatorcontrib>CHOI, Suk Young</creatorcontrib><creatorcontrib>LEE, Hyung-joo</creatorcontrib><creatorcontrib>JEONG, Min Gyo</creatorcontrib><creatorcontrib>SON, SUNG HOON</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIM, Taewan</au><au>SHIN, Inkyun</au><au>KIM, Seong Yoon</au><au>LEE, GeonGon</au><au>CHO, Hahyeon</au><au>KIM, Suhyeon</au><au>CHOI, Suk Young</au><au>LEE, Hyung-joo</au><au>JEONG, Min Gyo</au><au>SON, SUNG HOON</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>BLANK MASK AND PHOTOMASK USING THE SAME</title><date>2023-05-04</date><risdate>2023</risdate><abstract>The blank mask according to one embodiment of the present disclosure comprises a transparent substrate and a multilayer light shielding film disposed on the transparent substrate. The multilayer light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The multilayer light shielding film comprises a first light shielding film and a second light shielding film disposed on the first light shielding film. The multilayer light shielding film comprises total nine parts that are formed by trisection in a width direction and a length direction of an upper surface of the multilayer light shielding film. Each part of the multilayer light shielding film comprises a measuring range disposed in a side thereof. The measuring range is corresponded to a range between a point distant from an upper boundary of the first light shielding film to a lower boundary of the first light shielding film and a point distant from a lower boundary of the second light shielding film to an upper boundary of the second light shielding film, in respective sides of the parts of the multilayer light shielding film. The multilayer light shielding film has dR (difference value of roughness) values of Equation 1 below respectively measured from the total nine parts of the multilayer light shielding film, and an average value of dR values of the Equation 1 is 3 nm or less.dR=Rac−Rbc [Equation 1]The Rac is a surface roughness [unit: nm] measured from the measuring range of the part of the multilayer light shielding film, after the part of the multilayer light shielding film are soaked for 800 seconds in SC-1 (Standard Clean-1) solution and rinsed by ozone water.The Rbc is a surface roughness [unit: nm] measured from the measuring range of the part of the multilayer light shielding film before the part of the multilayer light shielding film are soaked in the SC-1 solution.The SC-1 solution is a solution comprising NH4OH of 14.3 wt %, H2O2 of 14.3 wt %, and H2O of 71.4 wt %.The ozone water is a solution comprising ozone in an amount of 20 ppm (by weight) with ultrapure water as a solvent.In such a case, during an enhanced cleaning, the multilayer light shielding film can have excellent durability against a cleaning solution in all the areas thereof.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | BLANK MASK AND PHOTOMASK USING THE SAME |
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