MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

A manufacturing method of a semiconductor device includes the following steps. A semiconductor structure including a substrate, a gallium nitride layer, semiconductor device units, and a scribe line region is provided. The gallium nitride layer is disposed on a first surface of the substrate. The se...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Chiang, Meng-Ting
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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