SYSTEM FOR SUPPLYING PHOTORESIST AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

A photoresist supplying system includes a pump that includes a first tube phragm that stores a photoresist and a filter that filters the photoresist, a second tube phragm that stores the photoresist and is disposed outside the pump, where the second tube phragm transfers the photoresist to the first...

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Bibliographische Detailangaben

Hauptverfasser:	Heo, Seok, Sasa, Takashi, Oh, Kyoung Whan, Lee, Sang Ho, Kim, Ho Kyun, Lee, Ju Hyung
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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