ELECTROSTATIC EDGE RING MOUNTING SYSTEM FOR SUBSTRATE PROCESSING

An edge ring system comprising a substrate support configured to support a substrate during plasma processing and including a baseplate and an upper layer arranged on the baseplate. An edge ring support includes a first body and an electrostatic clamping electrode arranged in the first body. The edg...

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Bibliographische Detailangaben
Hauptverfasser: MACE, Adam Christopher, COMENDANT, Keith, KOZAKEVICH, Felix Leib, HOLLAND, John, MARAKHTANOV, Alexei, EHRLICH, Darrell, MATYUSHKIN, Alexander
Format: Patent
Sprache:eng
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