SUBSTRATE TREATMENT APPARATUS AND METHOD

Provided is a substrate treatment apparatus with improved workability. The substrate treatment apparatus includes: a first bath storing a cleaning solution and having a first opening formed in an upper surface thereof; and a first ultrasonic oscillator installed in the first bath and providing ultra...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE, Sung Ho, EOM, Sung Hun, JANG, Ju Yong
Format: Patent
Sprache:eng
Schlagworte:
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