CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE
A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid carrier, an anionic polymer or surfactant, and a cationic polymer.
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| creator | Shie, Chi-Rung Zhang, Na Wu, Hsin-Yen Lee, Yang-Yao Dockery, Kevin P |
| description | A chemical mechanical polishing composition comprises, consists of, or consists essentially of a liquid carrier, anionic particles dispersed in the liquid carrier, an anionic polymer or surfactant, and a cationic polymer. |
| format | Patent |
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| language | eng |
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| subjects | ADHESIVES CHEMISTRY DYES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES |
| title | CMP COMPOSITION INCLUDING AN ANIONIC ABRASIVE |
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