POWER SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING POWER SEMICONDUCTOR DEVICE, AND POWER CONVERSION DEVICE

An object of the present disclosure is to provide a trench gate type power semiconductor device that does not easily break even when stress is applied. A SiC-MOSFET includes a SiC substrate, a drift layer of a first conductive type, formed on the SiC substrate, a base region of a second conductivity...

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Bibliographische Detailangaben
1. Verfasser:	NAKATA, Kazunari
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR CONVERSION BETWEEN AC AND AC, BETWEEN AC AND DC,OR BETWEEN DC AND DC, AND FOR USE WITH MAINS OR SIMILAR POWERSUPPLY SYSTEMS BASIC ELECTRIC ELEMENTS CONTROL OR REGULATION THEREOF CONVERSION OF DC OR AC INPUT POWER INTO SURGE OUTPUTPOWER CONVERSION OR DISTRIBUTION OF ELECTRIC POWER ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERATION SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	An object of the present disclosure is to provide a trench gate type power semiconductor device that does not easily break even when stress is applied. A SiC-MOSFET includes a SiC substrate, a drift layer of a first conductive type, formed on the SiC substrate, a base region of a second conductivity type formed in a surface layer of the drift layer, a source region of the first conductivity type selectively formed in a surface layer of the base region, a trench extending through the base region and the source region and reaching the drift layer, a gate electrode embedded in the trench and having a V-shaped groove on an upper surface thereof, and an oxide film formed on an upper surface including the groove of the gate electrode, in which a bottom of the V-shape groove is deeper than the base region.