HIGHLY ETCH SELECTIVE AMORPHOUS CARBON FILM

Methods and techniques for deposition of amorphous carbon films on a substrate are provided. In one example, the method includes depositing an amorphous carbon film on an underlayer positioned on a susceptor in a first processing region. The method further includes implanting a dopant or the inert s...

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Hauptverfasser: OSHIO, Hidetaka, CHAVVA, Venkataramana R, BOBEK, Sarah, KULSHRESHTHA, Prashant Kumar, LEE, Kwangduk Douglas, WHITESELL, Harry, FALK, Scott, PRASAD, Rajesh, MITTAL, Deven Matthew Raj, LEE, Dong Hyung
Format: Patent
Sprache:eng
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