Pressure Control System for a Multi-Head Processing Chamber of a Plasma Processing Apparatus

A pressure control system is provided. The pressure control system includes a member at least partially positioned within a pumping port fluidly coupled between a multi-head processing chamber and a pump configured to evacuate gases from the multi-head processing chamber. The member is rotatable rel...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Guan, Changle, Li, Junliang, Long, Maolin
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!