METHOD FOR REDUCING SCHOTTKY BARRIER HEIGHT AND SEMICONDUCTOR DEVICE WITH REDUCED SCHOTTKY BARRIER HEIGHT

A method for controlling Schottky barrier height in a semiconductor device includes forming an alloy layer including at least a first element and a second element on a first surface of a semiconductor substrate. The semiconductor substrate is a first element-based semiconductor substrate, and the fi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHENG, Hung-Hsiang, PAN, Samuel C
Format: Patent
Sprache:eng
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