Gas Control in Semiconductor Processing

The present disclosure describes a method for controlling gas supplies and an example system for performing the method. The method includes providing a first setting to configure a gas supply device to supply a first gas mixture to a substrate carrier holding a first substrate. The method further in...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHANG, Yen-Lin, Fang, Pu-Kuan, Lin, Mu-Tsang, Yen, Yung-Ta
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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