ION SOURCE WITH MULTIPLE BIAS ELECTRODES

An ion source has an arc chamber having first and second ends and an aperture plate to enclose a chamber volume. An extraction aperture is disposed between the first and second ends. A cathode is near the first end of the arc chamber, and a repeller is near the second end. A generally U-shaped first...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Platow, Wilhelm, Farley, Marvin, Bassom, Neil, Sporleder, David, Silverstein, Paul
Format: Patent
Sprache:eng
Schlagworte:
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