SUBSTRATE HANDLING DEVICE AND PROCESSING CHAMBER
A substrate handling device includes a substrate reception area defined by an edge. The substrate reception area includes a planar surface, wherein the edge extends upward from the planar surface. The substrate reception area further includes a plurality of contact structures extending upwards from...
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| creator | CHOU, You-Hua CHUANG, Kuo-Sheng |
| description | A substrate handling device includes a substrate reception area defined by an edge. The substrate reception area includes a planar surface, wherein the edge extends upward from the planar surface. The substrate reception area further includes a plurality of contact structures extending upwards from the planar surface, wherein a first contact structure of the plurality of contact structures directly contacts a side surface of the edge, a second contact structure of the plurality of contact structures separated from the edge, a shape of the first contact structure is different from a shape of the second contact structure. The substrate reception area and the planar surface include a first material. Each contact structure of the plurality of contact structures includes a second material different from the first material, and the second material has a hardness aligned to a hardness of a substrate material. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2022331976A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2022331976A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2022331976A13</originalsourceid><addsrcrecordid>eNrjZDAIDnUKDglyDHFV8HD0c_Hx9HNXcHEN83R2VQByFQKC_J1dg4NBos4ejr5OrkE8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSQ-NNjIwMjI2NjQ0tzM0dCYOFUAv-InJQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SUBSTRATE HANDLING DEVICE AND PROCESSING CHAMBER</title><source>esp@cenet</source><creator>CHOU, You-Hua ; CHUANG, Kuo-Sheng</creator><creatorcontrib>CHOU, You-Hua ; CHUANG, Kuo-Sheng</creatorcontrib><description>A substrate handling device includes a substrate reception area defined by an edge. The substrate reception area includes a planar surface, wherein the edge extends upward from the planar surface. The substrate reception area further includes a plurality of contact structures extending upwards from the planar surface, wherein a first contact structure of the plurality of contact structures directly contacts a side surface of the edge, a second contact structure of the plurality of contact structures separated from the edge, a shape of the first contact structure is different from a shape of the second contact structure. The substrate reception area and the planar surface include a first material. Each contact structure of the plurality of contact structures includes a second material different from the first material, and the second material has a hardness aligned to a hardness of a substrate material.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHAMBERS PROVIDED WITH MANIPULATION DEVICES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; HAND TOOLS ; MANIPULATORS ; PERFORMING OPERATIONS ; PORTABLE POWER-DRIVEN TOOLS ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221020&DB=EPODOC&CC=US&NR=2022331976A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221020&DB=EPODOC&CC=US&NR=2022331976A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>CHOU, You-Hua</creatorcontrib><creatorcontrib>CHUANG, Kuo-Sheng</creatorcontrib><title>SUBSTRATE HANDLING DEVICE AND PROCESSING CHAMBER</title><description>A substrate handling device includes a substrate reception area defined by an edge. The substrate reception area includes a planar surface, wherein the edge extends upward from the planar surface. The substrate reception area further includes a plurality of contact structures extending upwards from the planar surface, wherein a first contact structure of the plurality of contact structures directly contacts a side surface of the edge, a second contact structure of the plurality of contact structures separated from the edge, a shape of the first contact structure is different from a shape of the second contact structure. The substrate reception area and the planar surface include a first material. Each contact structure of the plurality of contact structures includes a second material different from the first material, and the second material has a hardness aligned to a hardness of a substrate material.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHAMBERS PROVIDED WITH MANIPULATION DEVICES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>HAND TOOLS</subject><subject>MANIPULATORS</subject><subject>PERFORMING OPERATIONS</subject><subject>PORTABLE POWER-DRIVEN TOOLS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAIDnUKDglyDHFV8HD0c_Hx9HNXcHEN83R2VQByFQKC_J1dg4NBos4ejr5OrkE8DKxpiTnFqbxQmptB2c01xNlDN7UgPz61uCAxOTUvtSQ-NNjIwMjI2NjQ0tzM0dCYOFUAv-InJQ</recordid><startdate>20221020</startdate><enddate>20221020</enddate><creator>CHOU, You-Hua</creator><creator>CHUANG, Kuo-Sheng</creator><scope>EVB</scope></search><sort><creationdate>20221020</creationdate><title>SUBSTRATE HANDLING DEVICE AND PROCESSING CHAMBER</title><author>CHOU, You-Hua ; CHUANG, Kuo-Sheng</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2022331976A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHAMBERS PROVIDED WITH MANIPULATION DEVICES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>HAND TOOLS</topic><topic>MANIPULATORS</topic><topic>PERFORMING OPERATIONS</topic><topic>PORTABLE POWER-DRIVEN TOOLS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>CHOU, You-Hua</creatorcontrib><creatorcontrib>CHUANG, Kuo-Sheng</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>CHOU, You-Hua</au><au>CHUANG, Kuo-Sheng</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SUBSTRATE HANDLING DEVICE AND PROCESSING CHAMBER</title><date>2022-10-20</date><risdate>2022</risdate><abstract>A substrate handling device includes a substrate reception area defined by an edge. The substrate reception area includes a planar surface, wherein the edge extends upward from the planar surface. The substrate reception area further includes a plurality of contact structures extending upwards from the planar surface, wherein a first contact structure of the plurality of contact structures directly contacts a side surface of the edge, a second contact structure of the plurality of contact structures separated from the edge, a shape of the first contact structure is different from a shape of the second contact structure. The substrate reception area and the planar surface include a first material. Each contact structure of the plurality of contact structures includes a second material different from the first material, and the second material has a hardness aligned to a hardness of a substrate material.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHAMBERS PROVIDED WITH MANIPULATION DEVICES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HAND TOOLS MANIPULATORS PERFORMING OPERATIONS PORTABLE POWER-DRIVEN TOOLS SEMICONDUCTOR DEVICES TRANSPORTING |
| title | SUBSTRATE HANDLING DEVICE AND PROCESSING CHAMBER |
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