Semiconductor Device and Method of Manufacture

Semiconductor devices and methods which utilize a treatment process of a bottom anti-reflective layer are provided. The treatment process may be a physical treatment process in which material is added in order to fill holes and pores within the material of the bottom anti-reflective layer or else th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Huang, Ming-Chi, Chuang, Ying-Liang, Hsu, Yao-Wen
Format: Patent
Sprache:eng
Schlagworte:
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