METHOD AND STRUCTURE OF MIDDLE LAYER REMOVAL

Aspects of the disclosure provide a method. The method includes forming a structure over a substrate, and forming a spacer layer on the structure, wherein the spacer layer has a recess. The method includes forming a mask layer over the spacer layer and in the recess, the mask layer including a first...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CHOU, Chun-Li, WU, Chia-Wei, YANG, Neng-Jye, HSU, Wan Hsuan, CHEN, Nai-Chia
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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