SUBSTRATE POLISHING SYSTEM AND SUBSTRATE POLISHING METHOD

SUBSTRATE POLISHING SYSTEM AND SUBSTRATE POLISHING METHOD

A substrate polishing method for polishing a substrate through a polishing pad according to an embodiment may comprise: a preheating step of increasing the temperature of the polishing pad by supplying heated pure water to the polishing pad before polishing the substrate; and a temperature control s...

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Hauptverfasser: JUNG, Hee Cheul, SHIM, Hyung Seob, YUN, Geun Sik, SHIN, Sung Ho
Format: Patent
Sprache:eng
Schlagworte:
DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
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creator JUNG, Hee Cheul
SHIM, Hyung Seob
YUN, Geun Sik
SHIN, Sung Ho
description A substrate polishing method for polishing a substrate through a polishing pad according to an embodiment may comprise: a preheating step of increasing the temperature of the polishing pad by supplying heated pure water to the polishing pad before polishing the substrate; and a temperature control step of controlling the temperature of the polishing pad by adjusting the temperature of the slurry supplied to the polishing pad in a polishing process of the substrate.
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subjects DRESSING OR CONDITIONING OF ABRADING SURFACES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
TRANSPORTING
title SUBSTRATE POLISHING SYSTEM AND SUBSTRATE POLISHING METHOD
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