ADVANCED LITHOGRAPHY AND SELF-ASSEMBLED DEVICES
Advanced lithography techniques including sub-10 nm pitch patterning and structures resulting therefrom are described. Self-assembled devices and their methods of fabrication are described.
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Advanced lithography techniques including sub-10 nm pitch patterning and structures resulting therefrom are described. Self-assembled devices and their methods of fabrication are described. |
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