METHOD OF FORMING PATTERNS USING RESIST UNDERLAYER COMPOSITION

A resist underlayer composition and a method of forming patterns, the composition including a polymer including at least one of a first moiety represented by Chemical Formula 1-1 and a second moiety represented by Chemical Formula 1-2; a thermal acid generator including a salt composed of an anion o...

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Bibliographische Detailangaben
Hauptverfasser: KWON, Soonhyung, BAE, Shinhyo, BAEK, Jaeyeol, CHOI, Yoojeong, PARK, Hyeon
Format: Patent
Sprache:eng
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