SUBSTRATE PROCESSING APPARATUS, SUBSTRATE HOLDING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

There is provided a technique that includes a process chamber configured to process at least one substrate; a microwave generator configured to generate a microwave; a substrate holder configured to load and hold the at least one substrate; and a rotator which includes an output shaft configured to...

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Hauptverfasser: YAMAZAKI, Keishin, YAMAGISHI, Norichika
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creator YAMAZAKI, Keishin
YAMAGISHI, Norichika
description There is provided a technique that includes a process chamber configured to process at least one substrate; a microwave generator configured to generate a microwave; a substrate holder configured to load and hold the at least one substrate; and a rotator which includes an output shaft configured to support the substrate holder and an input shaft installed at an off-centered position with respect to the output shaft.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title SUBSTRATE PROCESSING APPARATUS, SUBSTRATE HOLDING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
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