PLASMA PROCESSING APPARATUS

A plasma processing apparatus includes: a coaxial tube that extends in a vertical direction and forms a portion of a radio frequency waveguide; a substrate support configured to support a substrate; an electrode including a gas flow path connected to a gas ejection port opened toward a space above t...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	IKEDA, Taro, KITAHARA, Toshifumi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
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