DROPLET DEPOSITION APPARATUS
A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generat...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | OGAWA, Tamaki MIYAMOTO, Kazuhito SHIBATANI, Masaya MASUDA, Tomoyoshi |
description | A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generator to form a standing wave in the space, causing the droplet supplier to supply the droplet to a node of the standing wave generated in the space, and bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2022219191A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2022219191A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2022219191A13</originalsourceid><addsrcrecordid>eNrjZJBxCfIP8HENUXBxDfAP9gzx9PdTcAwIcAxyDAkN5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgZGRkaGlkDoaGhMnCoAEFEh-g</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>DROPLET DEPOSITION APPARATUS</title><source>esp@cenet</source><creator>OGAWA, Tamaki ; MIYAMOTO, Kazuhito ; SHIBATANI, Masaya ; MASUDA, Tomoyoshi</creator><creatorcontrib>OGAWA, Tamaki ; MIYAMOTO, Kazuhito ; SHIBATANI, Masaya ; MASUDA, Tomoyoshi</creatorcontrib><description>A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generator to form a standing wave in the space, causing the droplet supplier to supply the droplet to a node of the standing wave generated in the space, and bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece.</description><language>eng</language><subject>APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; ATOMISING APPARATUS ; DENTISTRY ; HUMAN NECESSITIES ; HYGIENE ; MEDICAL OR VETERINARY SCIENCE ; NOZZLES ; PERFORMING OPERATIONS ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SPRAYING APPARATUS ; SPRAYING OR ATOMISING IN GENERAL ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220714&DB=EPODOC&CC=US&NR=2022219191A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220714&DB=EPODOC&CC=US&NR=2022219191A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OGAWA, Tamaki</creatorcontrib><creatorcontrib>MIYAMOTO, Kazuhito</creatorcontrib><creatorcontrib>SHIBATANI, Masaya</creatorcontrib><creatorcontrib>MASUDA, Tomoyoshi</creatorcontrib><title>DROPLET DEPOSITION APPARATUS</title><description>A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generator to form a standing wave in the space, causing the droplet supplier to supply the droplet to a node of the standing wave generated in the space, and bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece.</description><subject>APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>ATOMISING APPARATUS</subject><subject>DENTISTRY</subject><subject>HUMAN NECESSITIES</subject><subject>HYGIENE</subject><subject>MEDICAL OR VETERINARY SCIENCE</subject><subject>NOZZLES</subject><subject>PERFORMING OPERATIONS</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SPRAYING APPARATUS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJBxCfIP8HENUXBxDfAP9gzx9PdTcAwIcAxyDAkN5mFgTUvMKU7lhdLcDMpuriHOHrqpBfnxqcUFicmpeakl8aHBRgZGRkaGlkDoaGhMnCoAEFEh-g</recordid><startdate>20220714</startdate><enddate>20220714</enddate><creator>OGAWA, Tamaki</creator><creator>MIYAMOTO, Kazuhito</creator><creator>SHIBATANI, Masaya</creator><creator>MASUDA, Tomoyoshi</creator><scope>EVB</scope></search><sort><creationdate>20220714</creationdate><title>DROPLET DEPOSITION APPARATUS</title><author>OGAWA, Tamaki ; MIYAMOTO, Kazuhito ; SHIBATANI, Masaya ; MASUDA, Tomoyoshi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2022219191A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>ATOMISING APPARATUS</topic><topic>DENTISTRY</topic><topic>HUMAN NECESSITIES</topic><topic>HYGIENE</topic><topic>MEDICAL OR VETERINARY SCIENCE</topic><topic>NOZZLES</topic><topic>PERFORMING OPERATIONS</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SPRAYING APPARATUS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>OGAWA, Tamaki</creatorcontrib><creatorcontrib>MIYAMOTO, Kazuhito</creatorcontrib><creatorcontrib>SHIBATANI, Masaya</creatorcontrib><creatorcontrib>MASUDA, Tomoyoshi</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OGAWA, Tamaki</au><au>MIYAMOTO, Kazuhito</au><au>SHIBATANI, Masaya</au><au>MASUDA, Tomoyoshi</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DROPLET DEPOSITION APPARATUS</title><date>2022-07-14</date><risdate>2022</risdate><abstract>A droplet deposition apparatus includes a standing wave generator including ultrasonic wave oscillators, a droplet supplier to supply a droplet, a workpiece retainer to retain a workpiece in a predetermined space, and a controller configured or programmed to execute causing the standing wave generator to form a standing wave in the space, causing the droplet supplier to supply the droplet to a node of the standing wave generated in the space, and bringing close to each other a predetermined position on the workpiece retained by the workpiece retainer and the node of the standing wave to which the droplet is supplied, to cause the droplet retained at the node of the standing wave to be deposited onto the workpiece.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_US2022219191A1 |
source | esp@cenet |
subjects | APPARATUS OR METHODS FOR ORAL OR DENTAL HYGIENE APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS DENTISTRY HUMAN NECESSITIES HYGIENE MEDICAL OR VETERINARY SCIENCE NOZZLES PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING |
title | DROPLET DEPOSITION APPARATUS |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-21T17%3A01%3A16IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=OGAWA,%20Tamaki&rft.date=2022-07-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2022219191A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |