INTEGRATED THIN FILM RESISTOR AND MEMORY DEVICE

The present disclosure relates to semiconductor structures and, more particularly, to an integrated thin film resistor with a memory device and methods of manufacture. The structure includes: a memory device in back end of line (BEOL) materials; and a thin film resistor located in the BEOL materials...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TAN, Yun Ling, LIN, Benfu, GAN, Kah Wee
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present disclosure relates to semiconductor structures and, more particularly, to an integrated thin film resistor with a memory device and methods of manufacture. The structure includes: a memory device in back end of line (BEOL) materials; and a thin film resistor located in the BEOL materials.