APPARATUS AND METHOD FOR CLEANING AN INSPECTION SYSTEM

A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NIKIPELOV, Andrey, Van Kampen, Maarten, Farokhipoor, Saeedeh
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS PHYSICS TESTING
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