METHODS FOR MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY
Methods for iteratively optimizing a two-dimensioned tiled area such as a lithographic mask include determining a halo area around each tile in the tiled area. An extended tile is made of a tile and a halo area. Each extended tile in the tiled area is iterated until a criterion is satisfied or a max...
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| creator | Ungar, P. Jeffrey Matsumoto, Hironobu |
| description | Methods for iteratively optimizing a two-dimensioned tiled area such as a lithographic mask include determining a halo area around each tile in the tiled area. An extended tile is made of a tile and a halo area. Each extended tile in the tiled area is iterated until a criterion is satisfied or a maximum number of iterations is met. Optimizing the extended tile produces a pattern for the tile such that at a perimeter of the tile, the pattern matches adjacent patterns that are calculated at perimeters of adjacent tiles. |
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Jeffrey</creatorcontrib><creatorcontrib>Matsumoto, Hironobu</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ungar, P. Jeffrey</au><au>Matsumoto, Hironobu</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHODS FOR MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY</title><date>2022-06-09</date><risdate>2022</risdate><abstract>Methods for iteratively optimizing a two-dimensioned tiled area such as a lithographic mask include determining a halo area around each tile in the tiled area. An extended tile is made of a tile and a halo area. Each extended tile in the tiled area is iterated until a criterion is satisfied or a maximum number of iterations is met. 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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTRIC DIGITAL DATA PROCESSING ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | METHODS FOR MODELING OF A DESIGN IN RETICLE ENHANCEMENT TECHNOLOGY |
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