CLEANING CHEMICAL LIQUID SUPPLY DEVICE AND CLEANING CHEMICAL LIQUID SUPPLY METHOD
A cleaning chemical liquid supply device includes: first and second mixers respectively mixing first chemical liquid with dilution water and respectively supplying to first and second nozzles respectively supplying the first chemical liquid adjusted to desired flow rates and concentrations to a firs...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KUNISAWA, JUNJI TOYOMASU, FUJIHIKO |
| description | A cleaning chemical liquid supply device includes: first and second mixers respectively mixing first chemical liquid with dilution water and respectively supplying to first and second nozzles respectively supplying the first chemical liquid adjusted to desired flow rates and concentrations to a first position and a second, different position of the substrate in the cleaning device; a first dilution water control box controlling flow rates of the dilution water supplied to the first and second mixers; third and fourth mixers respectively mixing second, different chemical liquid with the dilution water and respectively supplying to third and fourth nozzles for respectively supplying the second chemical liquid adjusted to desired flow rates and concentrations to a third position and a fourth, different position of the substrate in the cleaning device; and a second dilution water control box controlling flow rates of the dilution water supplied to the third and fourth mixers. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2022168783A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2022168783A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2022168783A13</originalsourceid><addsrcrecordid>eNrjZAh09nF19PP0c1dw9nD19XR29FHw8QwM9XRRCA4NCPCJVHBxDfN0dlVw9HNRIKTU1zXEw9-Fh4E1LTGnOJUXSnMzKLu5hjh76KYW5MenFhckJqfmpZbEhwYbGRgZGZpZmFsYOxoaE6cKAD1qMBY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CLEANING CHEMICAL LIQUID SUPPLY DEVICE AND CLEANING CHEMICAL LIQUID SUPPLY METHOD</title><source>esp@cenet</source><creator>KUNISAWA, JUNJI ; TOYOMASU, FUJIHIKO</creator><creatorcontrib>KUNISAWA, JUNJI ; TOYOMASU, FUJIHIKO</creatorcontrib><description>A cleaning chemical liquid supply device includes: first and second mixers respectively mixing first chemical liquid with dilution water and respectively supplying to first and second nozzles respectively supplying the first chemical liquid adjusted to desired flow rates and concentrations to a first position and a second, different position of the substrate in the cleaning device; a first dilution water control box controlling flow rates of the dilution water supplied to the first and second mixers; third and fourth mixers respectively mixing second, different chemical liquid with the dilution water and respectively supplying to third and fourth nozzles for respectively supplying the second chemical liquid adjusted to desired flow rates and concentrations to a third position and a fourth, different position of the substrate in the cleaning device; and a second dilution water control box controlling flow rates of the dilution water supplied to the third and fourth mixers.</description><language>eng</language><subject>CLEANING ; CLEANING IN GENERAL ; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; PREVENTION OF FOULING IN GENERAL ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220602&DB=EPODOC&CC=US&NR=2022168783A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220602&DB=EPODOC&CC=US&NR=2022168783A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KUNISAWA, JUNJI</creatorcontrib><creatorcontrib>TOYOMASU, FUJIHIKO</creatorcontrib><title>CLEANING CHEMICAL LIQUID SUPPLY DEVICE AND CLEANING CHEMICAL LIQUID SUPPLY METHOD</title><description>A cleaning chemical liquid supply device includes: first and second mixers respectively mixing first chemical liquid with dilution water and respectively supplying to first and second nozzles respectively supplying the first chemical liquid adjusted to desired flow rates and concentrations to a first position and a second, different position of the substrate in the cleaning device; a first dilution water control box controlling flow rates of the dilution water supplied to the first and second mixers; third and fourth mixers respectively mixing second, different chemical liquid with the dilution water and respectively supplying to third and fourth nozzles for respectively supplying the second chemical liquid adjusted to desired flow rates and concentrations to a third position and a fourth, different position of the substrate in the cleaning device; and a second dilution water control box controlling flow rates of the dilution water supplied to the third and fourth mixers.</description><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAh09nF19PP0c1dw9nD19XR29FHw8QwM9XRRCA4NCPCJVHBxDfN0dlVw9HNRIKTU1zXEw9-Fh4E1LTGnOJUXSnMzKLu5hjh76KYW5MenFhckJqfmpZbEhwYbGRgZGZpZmFsYOxoaE6cKAD1qMBY</recordid><startdate>20220602</startdate><enddate>20220602</enddate><creator>KUNISAWA, JUNJI</creator><creator>TOYOMASU, FUJIHIKO</creator><scope>EVB</scope></search><sort><creationdate>20220602</creationdate><title>CLEANING CHEMICAL LIQUID SUPPLY DEVICE AND CLEANING CHEMICAL LIQUID SUPPLY METHOD</title><author>KUNISAWA, JUNJI ; TOYOMASU, FUJIHIKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2022168783A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>KUNISAWA, JUNJI</creatorcontrib><creatorcontrib>TOYOMASU, FUJIHIKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KUNISAWA, JUNJI</au><au>TOYOMASU, FUJIHIKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CLEANING CHEMICAL LIQUID SUPPLY DEVICE AND CLEANING CHEMICAL LIQUID SUPPLY METHOD</title><date>2022-06-02</date><risdate>2022</risdate><abstract>A cleaning chemical liquid supply device includes: first and second mixers respectively mixing first chemical liquid with dilution water and respectively supplying to first and second nozzles respectively supplying the first chemical liquid adjusted to desired flow rates and concentrations to a first position and a second, different position of the substrate in the cleaning device; a first dilution water control box controlling flow rates of the dilution water supplied to the first and second mixers; third and fourth mixers respectively mixing second, different chemical liquid with the dilution water and respectively supplying to third and fourth nozzles for respectively supplying the second chemical liquid adjusted to desired flow rates and concentrations to a third position and a fourth, different position of the substrate in the cleaning device; and a second dilution water control box controlling flow rates of the dilution water supplied to the third and fourth mixers.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_US2022168783A1 |
| source | esp@cenet |
| subjects | CLEANING CLEANING IN GENERAL MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PREVENTION OF FOULING IN GENERAL TRANSPORTING |
| title | CLEANING CHEMICAL LIQUID SUPPLY DEVICE AND CLEANING CHEMICAL LIQUID SUPPLY METHOD |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-17T23%3A59%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KUNISAWA,%20JUNJI&rft.date=2022-06-02&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2022168783A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |