IMAGE SENSOR FOR IMMERSION LITHOGRAPHY

An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: GRIMM, Daniel, WRICKE, Sandro, BECKERS, Johan Franciscus Maria, RATHJE, Tim, BRAKHAGE, Peter, TILKE, Martin, BANERJEE, Nirupam, DONKERBROEK, Arend Johannes
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator GRIMM, Daniel
WRICKE, Sandro
BECKERS, Johan Franciscus Maria
RATHJE, Tim
BRAKHAGE, Peter
TILKE, Martin
BANERJEE, Nirupam
DONKERBROEK, Arend Johannes
description An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2022163896A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2022163896A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2022163896A13</originalsourceid><addsrcrecordid>eNrjZFDz9HV0d1UIdvUL9g9ScANiT19f16BgT38_BR_PEA9_9yDHAI9IHgbWtMSc4lReKM3NoOzmGuLsoZtakB-fWlyQmJyal1oSHxpsZGBkZGhmbGFp5mhoTJwqAF9wJLE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>IMAGE SENSOR FOR IMMERSION LITHOGRAPHY</title><source>esp@cenet</source><creator>GRIMM, Daniel ; WRICKE, Sandro ; BECKERS, Johan Franciscus Maria ; RATHJE, Tim ; BRAKHAGE, Peter ; TILKE, Martin ; BANERJEE, Nirupam ; DONKERBROEK, Arend Johannes</creator><creatorcontrib>GRIMM, Daniel ; WRICKE, Sandro ; BECKERS, Johan Franciscus Maria ; RATHJE, Tim ; BRAKHAGE, Peter ; TILKE, Martin ; BANERJEE, Nirupam ; DONKERBROEK, Arend Johannes</creatorcontrib><description>An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; CINEMATOGRAPHY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTROGRAPHY ; HOLOGRAPHY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MATERIALS THEREFOR ; METALLURGY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220526&amp;DB=EPODOC&amp;CC=US&amp;NR=2022163896A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20220526&amp;DB=EPODOC&amp;CC=US&amp;NR=2022163896A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GRIMM, Daniel</creatorcontrib><creatorcontrib>WRICKE, Sandro</creatorcontrib><creatorcontrib>BECKERS, Johan Franciscus Maria</creatorcontrib><creatorcontrib>RATHJE, Tim</creatorcontrib><creatorcontrib>BRAKHAGE, Peter</creatorcontrib><creatorcontrib>TILKE, Martin</creatorcontrib><creatorcontrib>BANERJEE, Nirupam</creatorcontrib><creatorcontrib>DONKERBROEK, Arend Johannes</creatorcontrib><title>IMAGE SENSOR FOR IMMERSION LITHOGRAPHY</title><description>An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDz9HV0d1UIdvUL9g9ScANiT19f16BgT38_BR_PEA9_9yDHAI9IHgbWtMSc4lReKM3NoOzmGuLsoZtakB-fWlyQmJyal1oSHxpsZGBkZGhmbGFp5mhoTJwqAF9wJLE</recordid><startdate>20220526</startdate><enddate>20220526</enddate><creator>GRIMM, Daniel</creator><creator>WRICKE, Sandro</creator><creator>BECKERS, Johan Franciscus Maria</creator><creator>RATHJE, Tim</creator><creator>BRAKHAGE, Peter</creator><creator>TILKE, Martin</creator><creator>BANERJEE, Nirupam</creator><creator>DONKERBROEK, Arend Johannes</creator><scope>EVB</scope></search><sort><creationdate>20220526</creationdate><title>IMAGE SENSOR FOR IMMERSION LITHOGRAPHY</title><author>GRIMM, Daniel ; WRICKE, Sandro ; BECKERS, Johan Franciscus Maria ; RATHJE, Tim ; BRAKHAGE, Peter ; TILKE, Martin ; BANERJEE, Nirupam ; DONKERBROEK, Arend Johannes</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2022163896A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2022</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MATERIALS THEREFOR</topic><topic>METALLURGY</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>GRIMM, Daniel</creatorcontrib><creatorcontrib>WRICKE, Sandro</creatorcontrib><creatorcontrib>BECKERS, Johan Franciscus Maria</creatorcontrib><creatorcontrib>RATHJE, Tim</creatorcontrib><creatorcontrib>BRAKHAGE, Peter</creatorcontrib><creatorcontrib>TILKE, Martin</creatorcontrib><creatorcontrib>BANERJEE, Nirupam</creatorcontrib><creatorcontrib>DONKERBROEK, Arend Johannes</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GRIMM, Daniel</au><au>WRICKE, Sandro</au><au>BECKERS, Johan Franciscus Maria</au><au>RATHJE, Tim</au><au>BRAKHAGE, Peter</au><au>TILKE, Martin</au><au>BANERJEE, Nirupam</au><au>DONKERBROEK, Arend Johannes</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>IMAGE SENSOR FOR IMMERSION LITHOGRAPHY</title><date>2022-05-26</date><risdate>2022</risdate><abstract>An image sensor for immersion lithography, the image sensor including: a grating; an absorber layer on the grating, the absorber layer configured to absorb radiation; and a liquidphobic coating at an upper surface of the image sensor, wherein a protective layer is provided between the absorber layer and the liquidphobic layer, the protective layer being less reactive than the absorber layer to an immersion liquid.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2022163896A1
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMICAL SURFACE TREATMENT
CHEMISTRY
CINEMATOGRAPHY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTROGRAPHY
HOLOGRAPHY
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
MATERIALS THEREFOR
METALLURGY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title IMAGE SENSOR FOR IMMERSION LITHOGRAPHY
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-05T04%3A18%3A27IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=GRIMM,%20Daniel&rft.date=2022-05-26&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2022163896A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true