CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL

CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL

Exemplary processing methods may include forming a plasma of a cleaning precursor in a remote region of a semiconductor processing chamber. The methods may include flowing plasma effluents of the cleaning precursor into a processing region of the semiconductor processing chamber. The methods may inc...

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Hauptverfasser: Khaja, Abdul Aziz, Prabhakar, Vinay, Balasubramanian, Ganesh, Ha, Sungwon, Wu, Fei
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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creator Khaja, Abdul Aziz
Prabhakar, Vinay
Balasubramanian, Ganesh
Ha, Sungwon
Wu, Fei
description Exemplary processing methods may include forming a plasma of a cleaning precursor in a remote region of a semiconductor processing chamber. The methods may include flowing plasma effluents of the cleaning precursor into a processing region of the semiconductor processing chamber. The methods may include contacting a substrate support with the plasma effluents for a first period of time. The methods may include lowering the substrate support from a first position to a second position while continuing to flow plasma effluents of the cleaning precursor. The methods may include cleaning the processing region of the semiconductor processing chamber for a second period of time.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
title CHAMBER CONFIGURATIONS AND PROCESSES FOR PARTICLE CONTROL
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