WAFER REGISTRATION AND OVERLAY MEASUREMENT SYSTEMS AND RELATED METHODS

A method for measuring overlay between an interest level and a reference level of a wafer includes applying a magnetic field to a wafer, detecting at least one residual magnetic field emitted from at least one registration marker of a first set of registration markers within the wafer, responsive to...

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Bibliographische Detailangaben
Hauptverfasser: Housley, Richard T, Dembi, Robert, Mirin, Nikolay A, Zhang, Xiaosong, Kramer, Stephen J, Harms, Jonathan D
Format: Patent
Sprache:eng
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